Cart
  • Free Shipping on all orders in Australia
  • Over 7 million books in stock
  • Proud to be B-Corp
  • We aim to be carbon neutral by 2022
  • Over 120,000 Trustpilot reviews
Item 1 of 0
Dry Etching for VLSI By A.J. van Roosmalen

Dry Etching for VLSI by A.J. van Roosmalen

Condition - New
$313,29
Only 2 left

Summary

This book has been written as part of a series of scientific books being published by Plenum Press. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI.

This book will be specially printed for your order, which means it may take a little longer to arrive (5 days). We do this to cut down on waste & to help protect our planet.

Dry Etching for VLSI Summary

Dry Etching for VLSI by A.J. van Roosmalen

This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing.

Table of Contents

1 Introduction.- 2 The Plasma State.- 3 The Ac Discharge.- 4 Gas and Surface Processes.- 5 Reactor Technology.- 6 Etch Processes.- 7 Diagnostics and Endpoint Detection.- References.- Selected Abstracts.

Additional information

NLS9781489925688
9781489925688
1489925686
Dry Etching for VLSI by A.J. van Roosmalen
New
Paperback
Springer-Verlag New York Inc.
2013-05-29
237
N/A
Book picture is for illustrative purposes only, actual binding, cover or edition may vary.
This is a new book - be the first to read this copy. With untouched pages and a perfect binding, your brand new copy is ready to be opened for the first time

Customer Reviews - Dry Etching for VLSI