Optical Lithography for Advanced Semiconductor Patterning by Peter De Bisschop

Optical Lithography for Advanced Semiconductor Patterning by Peter De Bisschop

Optical lithography is one of the key technologies in the fabrication of microchips. This book gives an account of modern lithography during the first half of the 2020s, when high-NA extreme-ultraviolet lithography (EUVL) was being introduced. Central to the book is a comprehensive description of the effects that impact the quality of the optical image inside the resist layer, a story that has become more complicated with every new lithography tool generation. This discussion builds gradually so that anyone with a graduate-type background in physics, chemistry, or mathematics can follow it from the start to the many subtleties of image formation in high-NA EUVL. It uses mathematics when useful and is accompanied by examples and case studies, many of which were created specifically for this book. This book will be of value for people who are new to lithography as well as for the more experienced lithographer.

SKU	Unavailable
ISBN 13	9781510680333
ISBN 10	1510680330
Title	Optical Lithography for Advanced Semiconductor Patterning
Author	Peter De Bisschop
Series	Press Monographs
Condition	Unavailable
Binding Type	Hardback
Publisher	SPIE Press
Year published	2025-05-31
Number of pages	1156
Cover note	Book picture is for illustrative purposes only, actual binding, cover or edition may vary.