Plasma Etching by M Sugawara

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Summary

The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

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Plasma Etching by M Sugawara

The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: (0) 178 25 1430
SKU Unavailable
ISBN 13 9780198562870
ISBN 10 019856287X
Title Plasma Etching
Author M Sugawara
Series Series On Semiconductor Science And Technology
Condition Unavailable
Binding Type Hardback
Publisher Oxford University Press
Year published 1998-05-28
Number of pages 356
Cover note Book picture is for illustrative purposes only, actual binding, cover or edition may vary.